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Optical Simulation Methodology

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The cost of CMOS image sensor pixel-based digital camera systems is being reduced through the use of smaller pixel sizes and larger fill-factors. However, CMOS pixel size reduction is only acceptable without sacrificing image quality. As CMOS pixel sizes continue to decrease, there is a reduction in image signal to noise as well as an increase in cross-talk between adjacent sensor pixels. These effects can be offset by careful design optimization through computer simulation which, at current pixel dimensions, requires full vectorial solution to Maxwell's equations.

 

In this topic we discuss the trends in CMOS image sensors, the implications for simulation, the types of results that can be simulated and describe the full simulation methodology to achieve them.

 

See also

Electrical simulation methodology

Examples

Related publications

F. Hirigoyen, A. Crocherie, J. M. Vaillant, and Y. Cazaux, “FDTD-based optical simulations methodology for CMOS image sensors pixels architecture and process optimization” Proc. SPIE 6816, 681609 (2008)

http://dx.doi.org/10.1117/12.766391

Jérôme Vaillant, Axel Crocherie, Flavien Hirigoyen, Adam Cadien, and James Pond, "Uniform illumination and rigorous electromagnetic simulations applied to CMOS image sensors," Opt. Express 15, 5494-5503 (2007) http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-9-5494

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